Extreme ultraviolet lithography (EUVL) Equipment Market: By Light Source (Laser pulsed Sn plasma, ArF excimer lasers, Relativistic Vacuum tube free-electron lasers and Synchrotron radiation); By Tools and By end-user - Forecast (2018-2023).

Report Code : ESR 0217 Format Type: PDF+ Excel Database

With the growth of the electronic device industry there has been an increasing demand for more efficient and cost effective production of electronic components to meet the rising demand. The demand for electronics comes from a number of applications which ranges from communication to consumer electronic devices to even sensor devices increases. In this respect, the demand for lithography systems increased considerably. Further to this there has been a trend in miniaturization of devices which would as a result require smaller electronic components. With miniaturization, the need for effective and specific lithography techniques has increased. In order to address this growing demand, extreme ultraviolet lithography systems have been developed.

Extreme Ultraviolet Lithography (EUVL) is a next generation lithography technology used in the manufacture of integrated circuits. The primary manufacturer of EUVL is ASML. The company believes there will be a surge in the number of projects in the 5 nm node region which will need a much higher numerical aperture than what is currently present in the market. Further to this, there will also be multiple patterning required which will be addressed by EUVL.

In terms of geographic contribution, the APAC region accounted for the highest share of EUVL systems and will continue to be the dominant market till well beyond the forecast period. Almost all of the semiconductor foundries and IDMs are located in the region and as such, lithography manufacturers and customers are present in this region. 

The market is dominated by a few key vendors who account for more than 60 percent of the market, with the remaining being occupied by much smaller players. The market conditions in terms of the level of investment required for lithography systems and technical expertise in the field ensure that the barrier for entry for new players is high. As such, only the current vendors will be able to survive and expand in the market with very less chance for a new vendor to enter.

Extreme ultraviolet lithography (EUVL) Equipment Market

The Extreme ultraviolet lithography (EUVL) Equipment market can be segmented on the basis of light source as:
  • Laser pulsed Sn plasma
  • ArF excimer lasers
  • Relativistic Vacuum tube free-electron lasers 
  • Synchrotron radiation 
In terms of tools, the Extreme ultraviolet lithography (EUVL) Equipment market has been segmented across the following:
  • Vacuum tube
  • mirrors
  • multilayer object
By end-user, the market has been segmented into following:
  • Foundry
  • Memory
  • IDM 
  • Others
The market has been segmented based on the following geographies:
  • North America
  • South America
  • APAC
  • Europe
  • Middle East 
  • Africa
Following are just a few of the companies that are operating in the Extreme ultraviolet lithography (EUVL) Equipment market:
  • ASML
  • Nikon
  • Canon
  • Vistec Semiconductor Systems
  • NuFlare Technology Inc. 
  • SUSS Microtec AG


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